The title of the project is 'Modelling electrical properties of thin high-k gate stacks(HfSiO, 30% Hf)'
The aim of this project is using the high-frequency capacitance voltage characteristic data to write a programme and identity ten tasks in order to comprehend the properties of thin high-k gate stacks.
The team has three members - Siu Sing Lung, Wang Yingjie and He Mingfei which are the three students from Department of Electrical Engineering and Electronics, University of Liverpool, UK. Our supervisor is Dr I.Z.Mitrovic.
No comments:
Post a Comment